Silicon on insulator optical membrane structure for fabry-perot MOEMS filter

Abstract

A process for fabricating an optical membrane device comprises providing a handle wafer and then oxidizing a surface of the handle wafer to form an insulating layer. A device wafer is then bonded to the handle wafer. An optical membrane structure is formed in this device wafer. The insulating layer is selectively removed to release the membrane structure. This device wafer can be manufactured from silicon wafer material. Such material typically has a low number of dislocations yielding a stable mechanical membrane structure. The insulating layer defines the electrical cavity across which electrical fields are established that are used to electrostatically deflect the membrane structure. The insulating layer is between 3 and 6 micrometers (μm) in thickness.

Dependencies are inferred from the claim text.