Optical profilometry of additional-material deviations in a periodic grating
AssigneeTimbre Technologies, Inc.
InventorsXinhui Niu, Nickhil Jakatdar
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AssigneeTimbre Technologies, Inc.
InventorsXinhui Niu, Nickhil Jakatdar
Estimating the term…
Disclosed is a method and system for measurement of periodic gratings which have deviations which result in more than two materials occurring along at least one line in the periodic direction. A periodic grating is divided into a plurality of hypothetical layers, each hypothetical layer having a normal vector orthogonal to the direction of periodicity, each hypothetical layer having a single material within any line parallel to the normal vector, and at least one of the hypothetical layers having at least three materials along a line in the direction of periodicity. A harmonic expansion of the permittivity ε or inverse permittivity 1/ε is performed along the direction of periodicity for each of the layers including the layer which includes the first, second and third materials. Fourier space electromagnetic equations are then set up in each of the layers using the harmonic expansion of the permittivity ε or inverse permittivity 1/ε, and Fourier components of electric and magnetic fields in each layer. The Fourier space electromagnetic equations are then coupled based on boundary conditions between the layers, and solved to provide the calculated diffraction spectrum.
A method for metrology of additional-material structural deviations of a nominal periodic structure by comparison of a measured diffraction spectrum from a target periodic structure with a calculated diffraction spectrum from a hypothetical deviated periodic structure defined by applying said additional-material structural deviations to said nominal periodic structure, said hypothetical deviated periodic structure having a direction of periodicity x, a direction of essentially-infinite extension y orthogonal to said direction of periodicity x, and a normal direction z orthogonal to said direction of periodicity x and said direction of extension y, calculation of said calculated diffraction spectrum comprising the steps of:
A method of generating the diffracted reflectivity associated with diffraction of electromagnetic radiation off a target periodic grating to determine structural properties of the target periodic grating, including:
A method of generating the diffracted reflectivity associated with diffraction of electromagnetic radiation off a target periodic grating to determine structural properties of the target periodic grating, including:
A method of generating an expression of the permittivity of a target periodic grating having more than two materials in a periodic direction for use in an optical profilometry formalism for determining a diffracted reflectivity of the target periodic grating comprising:
A computer readable storage medium containing computer executable code for generating the theoretical diffracted reflectivity associated with diffraction of electromagnetic radiation off a target periodic grating to determine structural properties of the target periodic grating by instructing a computer to operate as follows:
A computer readable storage medium containing computer executable code for generating the diffracted reflectivity associated with diffraction of electromagnetic radiation off a target periodic grating to determine structural properties of the target periodic grating by instructing a computer to operate as follows:
A computer readable storage medium containing computer executable code for generating an expression of the permittivity of a target periodic grating having more than two materials in a periodic direction for use in an optical profilometry formalism for determining a diffracted reflectivity of the target periodic grating by instructing a computer to operate as follows:
A system for generating a theoretical diffracted reflectivity associated with diffraction of electromagnetic radiation off a target periodic grating to determine structural properties of the target periodic grating, including a computer processor configured to:
A system of generating the diffracted reflectivity associated with diffraction of electromagnetic radiation off a target periodic grating to determine structural properties of the target periodic grating, including a computer microprocessor configured to:
A system of generating an expression of the permittivity of a target periodic grating having more than two materials in a periodic direction for use in an optical profilometry formalism for determining a diffracted reflectivity of the target periodic grating including a computer processor configured to:
Dependencies are inferred from the claim text.