Back to results
US 6,607,868 B2Granted
Photoresist monomers, polymers thereof, and photoresist compositions containing the same
AssigneeHynix Semiconductor Inc.
InventorJae Hak Choi
Life of this patent
Estimating the term…
Abstract
Dipropargyl acetamide derivatives of following Formula 1 which are photoresist monomers, polymers thereof, and photoresist compositions containing the same. The photoresist polymer has high etching resistance, adhesiveness and post-exposure delay stability. As a result, the photoresist composition is suitable to form a fine pattern in a deep ultraviolet region. wherein, n is an integer from 0 to 5.
Claims24
A photoresist monomer of following Formula 1:
- wherein, n is an integer from 0 to 5.
A photoresist polymer comprising dipropargyl acetamide of following Formula 1 as a first monomer:
- wherein, n is an integer from 0 to 5.
Dependencies are inferred from the claim text.