Organometal-containing norbornene monomer, photoresist containing its polymer, manufacturing method thereof, and method of forming photoresist patterns

A photoresist comprising a polymer and a photosensitive acid generator as shown in the following Formula (III),

• wherein R1 to R8 independently represent hydrogen, alkyls having from 1 to 4 carbon atoms, alkoxy having from 1 to 4 carbon atoms, phenyl or —MR′3;
• M is either Si, Ge, Sn or OSi;
• and R′ is either alkyl having from 1 to 4 carbon atoms, alkoxy having from 1 to 4 carbon atoms, phenyl, benzyl or phenoxy;
• n is degree of polymerization and is between 1 to 100.

A photoresist comprising a polymer and a photosensitive acid generator as shown in the following Formula (VI),

• wherein, A represents the following Formula (VII) or (VIII),
• and B represents the following Formula (IX), (X) or (XI),
• wherein R1 to R10 independently represent hydrogen, alkyls having from 1 to 4 carbon atoms, alkoxy having from 1 to 4 carbon atoms, phenyl or —MR′3;
• M is either Si, Ge, Sn or OSi;
• and R′ is either alkyl having from 1 to 4 carbon atoms, alkoxy having from 1 to 4 carbon atoms, phenyl, benzyl or phenoxy;
• R11, to R13 independently represent hydrogen or alkyl;
• x,y,z are mole ratio of a polymer and x+y+z=1.