Exposure method of production of density filter
AssigneeNikon Corporation
InventorNobuyuki Irie
Life of this patent
Estimating the term…
Abstract
A method of exposure while gradually reducing the exposure at peripheral parts when transferring patterns to a plurality of areas on a substrate where the peripheral parts are partially superposed, including exposing one shot area of the substrate through a density filter set so that the energy at the peripheral parts becomes a predetermined first distribution, measuring the distribution of exposure at portions corresponding to the peripheral parts on the substrate, determining a second distribution where the exposure at the peripheral parts becomes a target value based on the measured distribution of exposure, and exposes the shot areas adjoining the one shot area through a density filter set to give the second distribution.
Claims38
An exposure method of exposing each of a plurality of areas laid to overlap each other on a sensitive object with an energy beam through a setting device to gradually reduce a dose of exposure within an overlapped portion of each exposed area, comprising:
- changing, at the time of at least one time exposure of multiple exposures, at least one distribution of exposure of different distributions of exposure on said overlapped portion, in each of which the dose of exposure is gradually reduced and that are determined based on the number of exposures of the multiple exposures of said overlapped portion with said energy beam and correspond to the multiple exposures, respectively,
- forming said changed at least one distribution of exposure on said overlapped portion, so that an integrated exposed value of said overlapped portion by said multiple exposures becomes a target amount.
An exposure method of exposing each of a plurality of areas laid to overlap each other on a sensitive object with an energy beam through a setting device to gradually reduce a dose of exposure within an overlapped portion of each exposed area, comprising:
- irradiating said energy beam through said setting device onto a predetermined plane at which said sensitive object is arranged;
- detecting said energy beam, by a detection device having a light-blocking portion, whose reflectance is substantially the same as the reflectance of the surface of said sensitive object, arranged on said predetermined plane, through part of the light-blocking portion;
- and
- finding a distribution of exposure in which the dose of exposure is gradually reduced on said predetermined plane based on a detected result of said detection device.
An exposure method of exposing each of a plurality of areas laid to overlap each other on a sensitive object with an energy beam through a setting device to gradually reduce a dose of exposure within an overlapped portion of each exposed area, comprising:
- irradiating said energy beam through said setting device onto a predetermined plane at which said sensitive object is arranged;
- detecting said energy beam, by a detection device having a light-blocking portion, whose size is at least the same as the area whereon said energy beam is irradiated, arranged on said predetermined plane, through the part of the light-blocking portion;
- and
- finding a distribution of exposure in which the dose of exposure is gradually reduced on said predetermined plane based on a detected result of said detection device.
An exposure method of exposing each of a plurality of areas laid to overlap each other on a sensitive object with an energy beam through a setting device to gradually reduce a dose of exposure within an overlapped portion of each exposed area, comprising:
- irradiating said energy beam through said setting device onto a predetermined plane at which said sensitive object is arranged;
- detecting said energy beam, by a detection device having a light-blocking portion arranged on said predetermined plane, through part of the light-blocking portion;
- and
- finding a distribution of exposure in which the dose of exposure is gradually reduced on said predetermined plane based on a detected result of said energy beam and information relating to the difference between the reflectance at said light-blocking portion and the reflectance of said sensitive object.
An exposure method of exposing each of a plurality areas laid to overlap each other on a sensitive object with an energy beam through a setting device to gradually reduce a dose of exposure within an overlapped portion of each exposed area, comprising:
- irradiating said energy beam through said setting device onto a predetermined plane at which said sensitive object is arranged;
- detecting said energy beam, by a detection device having a light-blocking portion arranged on said predetermined plane, through a part of the light-blocking portion;
- and
- finding a distribution of exposure in which the dose of exposure is gradually reduced on said predetermined plane based on a detected result of said energy beam and information relating to the difference between the size of said light-blocking portion and the size of the area whereon said energy beam is irradiated.
An exposure method of exposing each of a plurality of areas laid to overlap each other on a sensitive object with an energy beam through a setting device to gradually reduce a dose of exposure within an overlapped portion of each exposed area, comprising:
- irradiating said energy beam through said setting device onto said sensitive object to expose the area of the sensitive object multiple times, so that a distribution of exposure, in which the dose of exposure is gradually reduced, is formed at every exposure of the multiple exposures on the exposed area;
- detecting the pattern formed on the exposed area by said multiple exposures;
- detecting patterns formed on said exposed areas by said multiple exposures;
- and
- determining the distribution of exposure in which the dose of exposure is gradually reduced on said overlapped portion of each of the areas, based on said detected result so that the shapes of the patterns formed on said overlapped portion by the exposure onto the areas become target values.
An exposure method of exposing each of a plurality of areas laid to overlap each other on a sensitive object with an energy beam through a setting device to gradually reduce a dose of exposure within an overlapped portion of each exposed area, comprising:
- providing said setting device with a density filter having an attenuating part gradually reducing the energy of the energy beam;
- multiply exposing said overlapped portion by the energy beam from said attenuating part;
- and
- adjusting the relative position between the energy beam irradiated from said density filter and a pattern to be transferred on said sensitive object at the time of at least one time exposure of said multiple exposures to control the integrated dose of exposures on the overlapped portion by said multiple exposures.
An exposure method of exposing each of a plurality of areas laid to overlap each other on a sensitive object with an energy beam through a setting device to gradually reduce a dose of exposure within an overlapped portion of each exposed area, comprising:
- providing said setting device with a density filter having an attenuating part gradually reducing the energy of the energy beam;
- multiply exposing said overlapped portion by the energy beam from said attenuating part;
- and
- adjusting the optical characteristics of an optical system arranged between said density filter and said patterns at the time of at least one time exposure of said multiple exposures to control the integrated dose of exposures on the overlapped portion by said multiple exposures.
An exposure method of exposing each of a plurality of areas laid to overlap each other on a sensitive object with an energy beam through a setting device to gradually reduce a dose of exposure within an overlapped portion of each exposed area, comprising:
- providing said setting device with a plurality of density filters having different attenuating characteristics of attenuating parts gradually reducing the energy of the energy beam;
- multiply exposing said overlapped portion by the energy beam from said attenuating part;
- and
- switching the density filters at the time of at least one time exposure of said multiple exposures to control the integrated dose of exposures on the overlapped portion by said multiple exposures.
An exposure method of exposing each of a plurality of areas laid to overlap each other on a sensitive object with an energy beam through a setting device to gradually reduce a dose of exposure within an overlapped portion of each exposed area, comprising:
- multiply exposing said overlapped portion by said energy beam, and determining the distribution of exposure, in which the dose of exposure is gradually reduced at the time of at least one time exposure of said multiple exposures, based on information relating to a change in optical characteristics of said overlapped portion due to said multiple exposures to control an integrated dose of exposures on the overlapped portion by said multiple exposures.
An exposure method of exposing each of areas laid to overlap each other on a sensitive object with an energy beam through a setting device to gradually reduce a dose of exposure within an overlapped portion of each exposed area, comprising:
- multiply exposing said overlapped portion by said energy beam so that different distributions of exposures, in each of which a dose of exposure corresponding to each exposure of the multiple exposures is gradually reduced, overlap each other on said sensitive object;
- and
- changing a width of a portion that said different distributions of exposures overlap each other on said sensitive object, to make the width different from the width of the overlapped portion without any change of the width of the overlapped portion, so as to control the integrated dose of exposures of said multiple exposures within said overlapped portion.
Dependencies are inferred from the claim text.