Cleaning of semiconductor process equipment chamber parts using organic solvents
AssigneeChemTrace Corporation
InventorSamantha Tan
Life of this patent
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Abstract
A system and method are provided for using an organic solvent to clean chamber parts used in semiconductor manufacturing. The chamber parts are exposed to the solvent using a dipping system or a vapor contact system in order to soften or dissolve the organic polymers. The solvent may be heated up to a temperature of 100° C. The organic cleaning solvent may be a pyrrole-based, amine-based, fluoro/ether-based or ether-based solvent. Additionally, a system and method are provided for establishing criteria to verify that the chamber parts are clean with respect to organic, metallic and particulate impurities and establishing criteria to verify that the physical surface morphology remains intact.
Claims15
A process for cleaning semiconductor fabrication equipment parts comprising:
- placing a part to be cleaned into a chamber;
- heating a liquid organic solvent to produce a vapor phase organic solvent within said chamber wherein said vapor phase of the organic solvent contacts said part to be cleaned purging said enclosed chamber with an inert gas;
- then and
- removing said part from said chamber.
Dependencies are inferred from the claim text.