Method for achieving a desired semiconductor wafer surface profile via selective polishing pad conditioning

Abstract

A system and method are presented for selectively conditioning a surface of a polishing pad of a CMP apparatus in order to achieve a desired surface profile of a semiconductor wafer. The semiconductor wafer may be subjected to a CMP operation using the CMP apparatus following the conditioning. The present CMP apparatus includes a polishing pad having an underside surface mechanically coupled to a substantially planar surface of a platen, an abrasive surface, and a measurement system. The platen and abrasive surface may be rotatable about respective rotational axes. The present conditioning method includes selecting a region of an upper “polishing” surface of the polishing pad (e.g., a CMP region) encircling a rotational axis of the platen and bounded by first and second radial distances from the rotational axis of the platen. An existing first radial profile of the polishing surface within the selected region may be determined using the measuring system, and a desired second radial profile of the polishing surface within the selected region may be chosen based upon the desired surface profile of the semiconductor wafer. During the conditioning, the abrasive surface may contact the polishing surface within the selected region at a radial distance from the rotational axis of the platen dependent upon the existing first and desired second radial profiles of the polishing surface such that the desired second radial profile is achieved during the conditioning.

Dependencies are inferred from the claim text.