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US 6,607,380 B1Granted
Substrate conveying system and device manufacturing method using the same
AssigneeCanon Kabushiki Kaisha
InventorHiroshi Nakazato
Life of this patent
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Abstract
A semiconductor exposure apparatus includes an exposure stage for holding a substrate when a predetermined exposure process is performed to the substrate, a transfer station for receiving a substrate from a resist coating unit, the transfer station having a temperature adjusting device for adjusting a temperature of the substrate, and a conveying device for conveying a substrate from the transfer station to the exposure stage.
Claims11
A semiconductor exposure apparatus comprising:
- exposure processing means for performing a predetermined exposure process to a substrate;
- a transfer station for receiving a substrate from a resist coating unit provided outside said semiconductor exposure apparatus, said transfer station having temperature adjusting means for adjusting temperature of a substrate;
- and
- conveying means for conveying a substrate from said transfer station to said exposure processing means,
- wherein said temperature adjusting means adjusts the temperature of the substrate in accordance with a state of processing at said exposure processing means.
2 more elements
A semiconductor exposure apparatus comprising:
- exposure processing means for performing a predetermined exposure process to a substrate;
- a transfer station for receiving a substrate from a resist coating unit, said transfer station having a temperature adjusting plate for adjusting temperature of a substrate;
- and
- conveying means for conveying a substrate from said transfer station to said exposure processing means, said conveying means having a conveying hand,
- wherein said temperature adjusting plate has a notch defined to avoid interference with said conveying hand of said conveying means.
2 more elements
A semiconductor manufacturing system comprising:
- a resist coating unit for coating a substrate with a resist;
- an exposure processing unit for performing a predetermined exposure process to a substrate;
- a transfer station for receiving a substrate from said resist coating unit, said transfer station having temperature adjusting means for adjusting temperature of a substrate;
- and
- conveying means for conveying a substrate from said transfer station to said exposure processing unit,
- wherein said temperature adjusting means adjusts temperature of a substrate in accordance with a state of processing at said exposure processing unit.
3 more elements
Dependencies are inferred from the claim text.