Scaling method for a digital photolithography system
AssigneeBall Semiconductor, Inc.
InventorsTakashi Kanatake, Wenhui Mei, Akira Ishikawa
Life of this patent
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Abstract
A method for scaling a pixel location in a digital photolithography system by rotating a pixel panel is provided. The method determines the angle of rotation of the pixel panel relative to a subject and calculates the original location of the pixel to be scaled. The method calculates the desired location of the pixel and determines the angle through which the pixel panel should be rotated to align the pixel with the desired location in a first dimension. The scan rate of the pixel panel and the subject is altered to align the pixel with the desired location in a second dimension.
Claims16
A method for scaling a pixel element on a subject positioned in a first plane, the method comprising:
- providing a pixel panel to generate the pixel element, the pixel panel positioned in a second plane substantially parallel to the first plane;
- determining a first scan rate;
- determining an original focal point of the pixel element on the subject;
- calculating a scaled focal point for the pixel element on the subject, the scaled focal point including a first coordinate in a first dimension and a second coordinate in a second dimension;
- rotating the pixel panel relative to the subject to position the pixel element at the first coordinate in the first dimension of the scaled focal point;
- and
- altering the first scan rate to a second scan rate to position the pixel element at the second coordinate in the second dimension of the scaled focal point.
A method for selectively rotating a pixel panel to reposition a pixel element from a first site to a second site for projection onto a subject, the method comprising:
- calculating the first site for the pixel element on the subject;
- calculating a first angle of rotation between the pixel panel and the subject, the first angle operable to align the pixel element with the first site in a first dimension and a second dimension;
- calculating the second site of the pixel element on the subject;
- calculating a second angle of rotation between the pixel panel and the subject, the second angle operable to align the pixel element with the second site in the first dimension;
- rotating the pixel panel from the first angle to the second angle to align the pixel element with the second site in the first dimension;
- and
- selectively moving the pixel panel with respect to the subject to align the pixel element with the second site in the second dimension.
A system for scaling a pixel element during photolithographic processing, the system comprising:
- a memory operable to store the pixel element;
- a pixel panel operable to receive the pixel element from the memory and project the pixel element onto a subject;
- a processor operable to rotate the pixel panel relative to the subject;
- and
- software stored in the memory, the software including instructions for:
- altering the relative positions of the pixel panel and the subject at a specified rate;
- determining an original location of the pixel element on the subject;
- calculating a scaled location for the pixel element on the subject, the scaled location including a first coordinate in a first dimension and a second coordinate in a second dimension;
- rotating the pixel panel relative to the subject to position the pixel element at the first coordinate in the first dimension of the scaled location;
- and
- altering the specified rate to position the pixel element at the second coordinate in the second dimension of the scaled location.
Dependencies are inferred from the claim text.