Optical system adjusting method for energy beam apparatus
AssigneeKabushiki Kaisha Toshiba
InventorsMunehiro Ogasawara, Jun Takamatsu, Hitoshi Sunaoshi, Naoharu Shimomaura
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Abstract
A method for adjusting an optical system of an energy beam apparatus by using a mark signal that is obtained by one-dimensionally or two-dimensionally scanning a mark on a sample with an energy beam. The mark has a one-dimensional or two-dimensional periodic structure. A first mark signal is detected by scanning the mark with a beam. The mark is set on the optical axis of the optical system. A second mark signal is detected by scanning the mark with a beam. The mark is located at a position that is deviated from the optical axis. A deviation of a deflection position is determined based on a phase difference between the first and second mark signals.
Claims6
A method for adjusting an optical system of an energy beam apparatus, comprising:
- preparing a mark having a one-dimensional or two dimensional periodic
- setting two small fields that are smaller than energy beam deflection-test regions so that a boundary of adjacent two of said small fields are in contact with each other, said boundary being set on said mark;
- detecting, for adjacent two small fields, mark signals in an overlap region of energy beam deflection-test regions by using said mark;
- and
- adjusting said optical system so that said mark signals for said adjacent two small fields coincide with each other.
Dependencies are inferred from the claim text.