Electrooptical substrate device and manufacturing method for same, electrooptical apparatus, electronic apparatus and manufacturing method for a substrate device

An electrooptical substrate device, comprising:

• a substrate;
• an insulator layer;
• an N-type single-crystal semiconductor layer formed above said insulator layer and including a P-type source region, a P-type drain region and a channel region;
• a gate electrode formed above said single-crystal semiconductor layer in said channel region through a gate insulating film;
• a scanning line connected to said gate electrode;
• a data line connected to one of said source region and said drain region;
• a pixel electrode connected to the other of said source region and said drain region,
• a P-channel transistor being architected by said single-crystal semiconductor layer, said gate insulating film and said gate electrode to switch-control said pixel electrode
• a peripheral circuit in a periphery of an image display region on which is formed said pixel electrode above said substrate,
• said peripheral circuit including an N-channel transistor, said N-channel transistor having a conductor layer to suck out carriers built up in the semiconductor layer thereof, and
• said P-channel transistor provided in said image display region not having a conductor layer to suck out carriers built up in the semiconductor layer thereof.