Loading patent…
AssigneeElionix, Inc.
InventorsMasanao Hotta, Yasuhiko Kojima, Takaomi Ito, Katsumi Yokota, Tetsuyuki Okabayashi, Akio Otani, Susumu Ono
Estimating the term…
In an electron beam lithography system, an outputted main signal is applied directly to deflection plates, whereas an outputted auxiliary signal is applied to the deflection plate through a capacitive coupling for writing a wide strip-like pattern accurately at a high speed. In the electron beam lithography system, a deflection signal is divided into a main signal having a low frequency and a large amplitude and an auxiliary signal having a high frequency and a small amplitude. The main signal is applied directly to deflection plates, and the auxiliary signal is applied to the deflection plate through a capacitor. In the case of writing a straight line having a certain width, and a solid graphic pattern, because the electron beam is deflected in a given direction and a given width by the use of the auxiliary signal in synchronism with one sweeping cycle based on the main signal, a line whose width is as wide as may times of the electron beam diameter can be written, and a graphic pattern having a certain width can be written at a high speed.
An electron beam lithography system for deflecting an electron beam using deflection plates and applying the electron beam to a surface of a substrate, characterized in that:
An electron beam lithography system for deflecting an electron beam using deflection plates and applying the electron beam to a surface of a substrate, said electron beam lithography system comprising:
An electron beam lithography method for deflecting an electron beam using a pair of deflection plates and applying the electron beam to a surface of a substrate, said electron beam lithography method comprising:
An electron beam lithography system for deflecting an electron beam using deflection plates and applying the electron beam to a surface of a substrate, said electron beam lithography system comprising:
Dependencies are inferred from the claim text.