Back to results
US 6,605,409 B2Granted
Positive resist composition
AssigneeFuji Photo Film Co., Ltd.
InventorsKunihiko Kodama, Shinichi Kanna
Life of this patent
Estimating the term…
Abstract
A positive resist composition comprising (A) a compound generating a specific sulfonimide compound by irradiation with an actinic ray or a radiation and (B) a resin having a group, which is decomposed by the action of an acid to increase the solubility of the composition in an alkali developer. The resist composition has an improved resolving power and an improved process allowance such as exposure margin and the depth of focus in a lithographic technique using a light source of short wavelengths capable of super fine working and a positive chemically amplified resist.
Claims32
A positive resist composition comprising:
- (A) a compound generating a compound represented by the formula (I) below by irradiation with an actinic ray or a radiation;
- and
- (B) a resin having a group which is decomposed by the action of an acid to increase the solubility of the composition in an alkali developer:
- wherein, Y represents a single bond, —CO—, or —SO2—;
- R′ and R″ are bonded to each other to form an alkylene group, an arylene group, or an aralkylene group, thereby, the structure of the formula (I) is in the form a ring.
2 more elements
A positive resist composition comprising:
- (A) a compound generating a compound represented by the formula (I) below by irradiation with an actinic ray or a radiation;
- (D) a compound having a molecular weight of not larger than 3000, which is decomposed by the action of an acid to increase the solubility in an alkali developer;
- and
- (E) an alkali-soluble resin:
- wherein, Y represents a single bond, —CO—, or —SO2—;
- R′ and R″ are bonded to each other to form an alkylene group, an arylene group, or an aralkylene group, and, thereby, the structure of the formula (I) is in the form of ring.
3 more elements
A sulfonium salt compound represented by the formula (IVa):
- wherein, R1 to R15 each independently represents a hydrogen atom, a straight chain or branched alkyl group having from 1 to 5 carbon atoms, a cyclic alkyl group having from 3 to 8 carbon atoms, an alkoxy group having from 1 to 4 carbon atoms, a halogen atom, or —S—R38 (wherein R38 represents a straight chain or branched alkyl group having from 1 to 5 carbon atoms, a cyclic alkyl group having from 3 to 8 carbon atoms, or an aryl group having from 6 to 14 carbon atoms);
- Ra and Rb each independently represents a hydrogen atom, a halogen atom, an alkyl group having from 1 to 5 carbon atoms, an alkoxy group having from 1 to 5 carbon atoms, a nitro group, or a hydroxy group.
A sulfonium salt compound represented by the formula (Va):
- wherein R16 to R27 each independently represents a hydrogen atom, a straight chain or branched alkyl group having from 1 to 5 carbon atoms, a cyclic alkyl group having from 3 to 8 carbon atoms, an alkoxy group having from 1 to 4 carbon atoms, a halogen atom, or —S—R38 (wherein R38 represents a straight chain or branched alkyl group having from 1 to 5 carbon atoms, a cyclic alkyl group having from 3 to 8 carbon atoms, or an aryl group having from 6 to 14 carbon atoms);
- Ra and Rb each independently represents a hydrogen atom, a halogen atom, an alkyl group having from 1 to 5 carbon atoms, an alkoxy group having from 1 to 5 carbon atoms, a nitro group, or a hydroxy group.
An iodonium salt compound represented by the formula (VIa):
- wherein R28 to R37 each independently represents a hydrogen atom, a straight chain or branched alkyl group having from 1 to 5 carbon atoms, a cyclic alkyl group having from 3 to 8 carbon atoms, an alkoxy group having from 1 to 4 carbon atoms, a halogen atom, or —S—R38 (wherein R38 represents a straight chain or branched alkyl group having from 1 to 5 carbon atoms, a cyclic alkyl group having from 3 to 8 carbon atoms, or an aryl group having from 6 to 14 carbon atoms);
- Ra and Rb each independently represents a hydrogen atom, a halogen atom, an alkyl group having from 1 to 5 carbon atoms, an alkoxy group having from 1 to 5 carbon atoms, a nitro group, or a hydroxy group.
A positive resist composition comprising:
- (A) a compound generating a compound represented by the formula (I) below by irradiation with an actinic ray or a radiation, wherein said compound generating a compound represented by the formula (I) is a sulfonium salt or an iodonium salt of the anion formed by a dissociation of N—H in the compound represented by the formula (I);
- and
- (B) a resin having a group which is decomposed by the action of an acid to increase the solubility of the composition in an alkali developer:
- wherein, Y represents a single bond, —CO—, or —SO2—;
- R′ and R″, which may be the same or different, each represents a straight chain, branched, or cyclic alkyl group which may be substituted, an aryl group which may be substituted, an aralkyl group which may be substituted, or a camphor group;
- R′ and R″ may be bonded to each other to form an alkylene group, an arylene group, or an aralkylene group, thereby, the structure of the formula (I) may form a ring;
- and when Y is a —CO— group, R″ may be a hydroxy group or an alkoxy group.
4 more elements
A positive resist composition comprising:
- (A) a compound generating a compound represented by the formula (I) below by irradiation with an actinic ray or a radiation, wherein said compound generating a compound represented by the formula (I) is a sulfonium salt or an iodonium salt of the anion formed by a dissociation of N—H in the compound represented by the formula (I);
- (D) a compound having a molecular weight of not larger than 3000, which is decomposed by the action of an acid to increase the solubility in an alkali developer;
- and
- (E) an alkali-soluble resin:
- wherein, Y represents a single bond, —CO—, or —SO2—;
- R′ and R″, which may be the same or different, each represents a straight chain, branched, or cyclic alkyl group which may be substituted, an aryl group which may be substituted, an aralkyl group which may be substituted, or a camphor group;
- R′ and R″ may be bonded to each other to form an alkylene group, an arylene group, or an aralkylene group, and, thereby, the structure of the formula (I) may form a ring;
- and when Y is a —CO— group, R″ may be a hydroxy group or an alkoxy group.
5 more elements
Dependencies are inferred from the claim text.