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AssigneeHoneywell International Inc.
InventorsTeresa Baldwin, Mary Richey, James S. Drage, Hui-Jung Wu, Richard Spear
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An absorbing ether-like compound including a siliconethoxy, silicondiethoxy, or silicontriethoxy species attached to a naphthalene or anthracene chromophore via an oxygen linkage is used as an organic light-absorbing compound. The absorbing ether-like compound is incorporated into spin-on glass materials to provide anti-reflective coating materials for deep ultraviolet photolithography. A method of synthesizing the light-absorbing ether compounds is based on the reaction of an alcohol-substituted chromophore with an acetoxysilicon compound in the presence of alcohol. A method of making absorbing spin-on-glass materials including the absorbing ether-like compounds is also provided.
A layered material, wherein at least one layer comprises a light-absorbing spin-on glass composition comprising a spin-on glass material and an incorporatable absorbing compound, wherein the absorbing compound comprises a silicon-containing moiety, an oxygen linkage to the silicon-containing moiety and at least one benzene ring.
A semiconductor device comprising a light-absorbing spin-on glass composition, wherein the composition comprises a spin-on glass material and an incorporatable absorbing compound, and further wherein the absorbing compound comprises a silicon-containing moiety, an oxygen linkage to the silicon-containing moiety and at least one benzene ring.
Dependencies are inferred from the claim text.