Method for fabricating planar optical waveguide devices

Abstract

Proposed is a method for fabricating a planar optical waveguide device having a plurality of core segments formed between a lower clad layer and an upper clad layer, in which a hot isostatic pressing process (HIP) is carried out during the fabrication process. The lower clad layer may consist of a substrate or a buffer layer formed on a substrate. Each layer may be formed either by a low-temperature film-forming process such as CVD or by the flame hydrolysis pressing process. The HIP process is also effective in eliminating voids when the core is formed in a recess of the lower clad layer. According to the tests conducted by the inventors, it was found that the HIP process can be conducted without requiring any protective layer or a gas barrier through proper selection of the condition for the HIP process, as opposed to the common belief that a protective layer or a gas barrier is essential for the HIP process.

Dependencies are inferred from the claim text.