Substrate support with gas feed-through and method
AssigneeApplied Material, Inc.
InventorsRichard R. Mett, Hamid Noorbakhsh, Robert D. Greenway
Life of this patent
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Abstract
A substrate support comprises an electrode and a dielectric layer covering the electrode, the dielectric layer having a surface to receive a substrate. A gas feed-through provides a gas to the surface of the dielectric layer and comprises a conduit extending through one or more of the dielectric layer and electrode. A dielectric insert in the gas feed-through has a passage therein that allows the gas to be flowed therethrough. Two opposing electrically conducting cups are around the passage in the dielectric insert.
Claims11
A substrate support comprising:
- (a) an electrode;
- (b) a dielectric layer covering the electrode, the dielectric layer having a surface to receive a substrate;
- (c) a gas feed-through to provide a gas to the surface of the dielectric layer, the gas feed-through comprising a conduit extending through one or more of the dielectric layer and electrode;
- (d) a dielectric insert in the gas feed-through, the dielectric insert having a passage therein that allows the gas to be flowed therethrough;
- and
- (e) two opposing electrically conducting cups around the passage in the dielectric insert.
A substrate support comprising:
- (a) an electrode;
- (b) a dielectric layer covering the electrode, the dielectric layer having a surface to receive a substrate;
- (c) a gas feed-through to provide a gas to the surface of the dielectric layer, the gas feed-through comprising a conduit extending through one or more of the dielectric layer and electrode;
- (d) a dielectric insert in the gas feed-through, the dielectric insert having a passage therein that allows the gas to be flowed therethrough;
- and
- (e) two opposing metal-containing shields around the passage in the dielectric insert, whereby the shields are capable of reducing plasma formation in the gas feed-through.
Dependencies are inferred from the claim text.