X-ray exposure apparatus
AssigneeCanon Kabushiki Kaisha
InventorsShigeru Terashima, Yutaka Watanabe
Life of this patent
Estimating the term…
Abstract
An X-ray exposure apparatus includes a partition structure for defining therein an ambience of one of an atmospheric pressure and a reduced pressure, for accommodating an X-ray mask and an article to be exposed, an X-ray window provided on the partition structure for spatially isolating the inside of the partition structure and an X-ray source, and having a function for transmitting therethrough an X-ray beam with which the article as placed inside the partition structure can be exposed through the X-ray mask, and a scanning mechanism for scanningly moving the X-ray window in a direction intersecting with an optical axis of the X-ray beam, in a single exposure and without interruption at least from just before the start of the exposure to just after the end of the exposure.
Claims20
An exposure apparatus, comprising:
- a container in which an object to be exposed can be disposed, said container having a window through which an exposure beam from a light source can enter said container;
- and
- a scanning mechanism for scanning said window in only one direction intersecting an optical path of the exposure beam, during irradiation of the exposure beam to the object to be exposed,
- wherein said window has an area which is wider than a required exposure region on the object to be exposed, with respect to the scan direction.
A device manufacturing method, comprising the steps of:
- supplying a wafer;
- and
- exposing the wafer by use of an exposure apparatus including a container in which an object to be exposed can be disposed, the container having a window through which an exposure beam from a light source can enter the container, and the exposure apparatus further including a scanning mechanism for scanning the window in only one direction intersecting an optical path of the exposure beam, during irradiation of the exposure beam to the object to be exposed,
- wherein said window has an area which is wider than a required exposure region on the object to be exposed, with respect to the scan direction.
An exposure apparatus, comprising:
- a container in which an object to be exposed can be disposed, said container having a window through which an exposure beam from a light source can enter said container;
- and
- a scanning mechanism for scanning said window in a direction intersecting an optical path of the exposure beam;
- wherein a probability that, during a period in which the exposure beam entered through said window irradiates the object to be exposed, said window is at a certain position is substantially constant independently of that position,
- wherein said window has an area which is wider than a required exposure region on the object to be exposed, with respect to the scan direction.
A device manufacturing method, comprising the steps of:
- supplying a wafer;
- and
- exposing the wafer by use of an exposure apparatus including a container in which an object to be exposed can be disposed, the container having a window through which an exposure beam from a light source can enter the container, and the exposure apparatus further including a scanning mechanism for scanning the window in a direction intersecting an optical path of the exposure beam;
- wherein a probability that, during a period in which the exposure beam entered through the window irradiates the object to be exposed, the window is at a certain position is substantially constant independently of that position,
- wherein said window has an area which is wider than a required exposure region on the object to be exposed, with respect to the scan direction.
Dependencies are inferred from the claim text.