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AssigneeCanon Kabushiki Kaisha
InventorsTadahiro Ohmi, Nobuyoshi Tanaka, Masaki Hirayama
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This invention relates to an excimer laser oscillation apparatus which has a laser chamber which stores a laser gas containing a gas mixture of at least one inert gas selected from the group consisting of Kr, Ar, and Ne, and F2 gas, and in which an inner surface thereof has a reflection-free surface with respect to light of a desired wavelength of 248 nm, 193 nm, or 157 nm, and the uppermost surface of the inner surface consists of a fluoride, an optical resonator which is made up of a pair of reflection mirrors arranged to sandwich the laser chamber therebetween, and in which the reflectance of the reflection mirror on the output side is 90% or more and microwave introduction means, arranged on the laser chamber, for continuously exciting the laser gas in the laser chamber.
An excimer laser apparatus comprising:
An excimer laser apparatus comprising:
An excimer laser apparatus comprising:
An excimer laser apparatus comprising:
An excimer laser apparatus comprising:
An excimer laser apparatus comprising:
A laser oscillation method comprising the steps of:
A laser oscillation method comprising the steps of:
An exposure apparatus comprising:
An exposure apparatus comprising:
An exposure apparatus comprising:
An exposure apparatus comprising:
An exposure apparatus comprising:
An exposure apparatus comprising:
Dependencies are inferred from the claim text.