Semiconductor device and method of manufacturing the same

A semiconductor device comprising:

• a first conductor member formed on a part of a semiconductor substrate and having a contact formation region;
• a second conductor member covering said first conductor member except for said contact formation region;
• an insulating film interposed between said first and second conductor members;
• and
• a low-resistance layer formed in contact with a surface of said contact formation region of said first conductor member and with a surface of said second conductor member, and
• a dummy conductor member arranged in parallel with said first conductor member on said semiconductor substrate and having a contact formation region,
• said semiconductor device being capable of selecting at least one of an inductor, a resistor, and a capacitor and allowing the selected one to function by using said first and second conductor members and said insulating film.

A semiconductor device comprising:

• a first conductor member formed on a part of a semiconductor substrate and having a contact formation region, said first conductor member having a linear configuration composed of a plurality of linear portions and at least one bent portion connecting said linear portions in a plane parallel with a surface of said semiconductor substrate;
• an insulating film covering said first conductor member except for said contact formation region and said bent portion;
• a low-resistance layer formed in contact with a surface of said contact formation region of said first conductor member and with a surface of said bent portion of said first conductor member;
• and
• a contact formed on said low-resistance layer, which is formed on said contact formation region.