Two-dimensional image detector and fabrication method of the same

Abstract

The invention provides a two-dimensional image detector having superior uniformity in thickness and composition of a photoconductive layer with respect to the entire substrate, and a method of productively (efficiently) and inexpensively manufacturing such a two-dimensional image detector. The two-dimensional image detector includes at least an active matrix substrate 1 having a plurality of pixel electrodes 10, and a photoconductive layer 2 stacked on the pixel electrodes 10, wherein the photoconductive layer 2 is transferred to the active matrix substrate 1 after being formed in a predetermined thickness on a transfer substrate. That is, a fabrication method of the two-dimensional image detector is the method in which the photoconductive layer 2 is formed in advance in a predetermined thickness on the transfer substrate and then transferred on the active matrix substrate 1. The photoconductive layer 2 includes a mixture of particulate photoconductors and a binder. The binder preferably has a softening point which is not more than a heat resistant temperature of the active matrix substrate 1.

Dependencies are inferred from the claim text.