Cleaning device with deeply reaching plasma and assisting electrodes
AssigneeNano Electronics and Micro System Technologies, Inc.
InventorsChia-Yuan Hsu, Yong-Hau Foo, Paul Hong
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Abstract
A cleaning device with deeply reaching plasma and assisting electrodes has supporting racks, a chamber, a plasma sources, metallic grids. Flat boards to be cleaned such as circuit boards are located in the supporting racks. The supporting racks are disposed in the chamber. The metallic grids are disposed on two sides of the chamber. The plasma source is disposed next to the metallic grids. Electric voltage is applied to the metallic grids such that plasma from the plasma source can be pushed deeply into the supporting racks to evenly and sufficiently clean the circuit boards.
Claims24
A plasma cleaning system for deep cleaning workpieces comprising:
- (a) a vacuum chamber, said vacuum chamber containing a gas introduced therein;
- (b) at least one supporting rack disposed in said vacuum chamber, said supporting rack having first and second end portions;
- (c) first and second plasma sources disposed to respectively oppose said first and second end portions of said supporting rack, said first and second plasma sources being operable to generate a plasma;
- and,
- (d) at least one metallic grid defining member disposed between each of said supporting rack first and second end portions and said first and second plasma sources, each said metallic grid defining member being actuated responsive to a predetermined electric voltage signal applied thereto for increasing the charge density of the plasma within said supporting rack.
Dependencies are inferred from the claim text.