Method for forming a region of low dielectric constant nanoporous material

A method for forming a region of low dielectric constant nanoporous material, said method comprising the steps of:

• a) combining a plurality of materials to form a solution, said plurality of materials comprising a low dielectric constant material, a pore generator material, and a solvent;
• b) applying said solution to a surface above which it is desired to form said region of low dielectric constant nanoporous material;
• and
• c) subjecting said solution, which has been applied to said surface, to a thermal process such that said region of low dielectric constant nanoporous material is formed above said surface, thermal process comprising:
• a baking stage, said baking stage performed to drive out said solvent,
• a first thermal treatment stage, said first thermal treatment stage performed to induce curing of said low dielectric constant material, and
• a second thermal treatment stage, said second thermal treatment stage performed to induce decomposition of said pore generator material such that nanopores are formed within said low dielectric constant material wherein said plurality of materials further comprise a surfactant.