Gas delivery system
AssigneeSurface Technology Systems Limited
InventorsJyoti Kiron Bhardwaj, Nicholas Shepherd, Leslie Michael Lea
Life of this patent
Estimating the term…
Abstract
A substrate is treated by supplying an etchant and/or deposition gas into a chamber in which the substrate is situated. In order to avoid the problems associated with transportation of toxic gases, the gases required for such processes are delivered directly from a gas generation and delivery system positioned locally to the chamber.
Claims13
An apparatus for treating a substrate, the apparatus comprising a chamber, a support for a substrate and a gas generation and delivery system for delivering an etchant gas into the chamber, wherein the gas generation and delivery system is positioned locally to the chamber.
An apparatus for treating a substrate, the apparatus comprising a chamber, a support for a substrate and a gas generation and delivery system for delivering an etchant gas into the chamber, wherein the gas generation and delivery system is positioned locally to the chamber, and wherein the gas generation and delivery system includes a molten electrolyte gas generator.
A method of treating a substrate comprising providing an etchant gas to a chamber in which the substrate is situated, wherein the gas is delivered from a gas generation and delivery system positioned locally to the chamber.
A method of treating a substrate comprising cyclically performing the following steps:
- a) etching the substrate with a gas;
- b) depositing a passivation layer on the surface of an etched feature;
- and
- c) selectively removing the passivation layer from the base of the etched feature,
- wherein the etchant gas comprises fluorine, nitrogen trifluoride or chlorotrifluoride or mixtures thereof generated locally.
An apparatus for treating a substrate, the apparatus comprising a chamber, a support for a substrate and a gas generation and delivery system for delivering a deposition gas into the chamber, wherein the gas generation and delivery system is positioned locally to the chamber.
An apparatus for treating a substrate, the apparatus comprising a chamber, a support for a substrate and a gas generation and delivery system for delivering a deposition gas into the chamber, wherein the gas generation and delivery system is positioned locally to the chamber, and wherein the gas generation and delivery system includes a molten electrolyte gas generator.
A method of treating a substrate comprising providing a deposition gas to a chamber in which the substrate is situated, wherein the gas is delivered from a gas generation and delivery system positioned locally to the chamber.
An apparatus for treating a substrate, the apparatus comprising a chamber, a support for a substrate and a gas generation and delivery system for delivering an etchant and a deposition gas into the chamber, wherein the gas generation and delivery system is positioned locally to the chamber.
An apparatus for treating a substrate, the apparatus comprising a chamber, a support for a substrate and a gas generation and delivery system for delivering an etchant and a deposition gas into the chamber, wherein the gas generation and delivery system is positioned locally to the chamber, and wherein the gas generation and delivery system includes a molten electrolyte gas generator.
A method of treating a substrate comprising providing an etchant and a deposition gas to a chamber in which the substrate is situated, wherein the gas is delivered from a gas generation and delivery system positioned locally to the chamber.
Dependencies are inferred from the claim text.