Plasma processing apparatus
AssigneeSurface Technology Systems Limited
InventorsJyoti Kiron Bhardwaj, Leslie Michael Lea
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Abstract
A workpiece support includes a support body having a surface for supporting a workpiece thereon, and at least one Langmuir probe embedded within the support body. The Langmuir probe is covered by a layer of semiconductor or insulator. The workpiece support further includes a mechanism for intermittently feeding RF power to Langmuir probe, and for measuring a discharge of a capacitor in series with the Langmuir probe while the RF power is not supplied to the Langmuir probe.
Claims6
A workpiece support comprising a support body having a surface for supporting a workpiece thereon, and at least one Langmuir probe embedded within the support body such that the at least one Langmuir probe is covered by a layer of semiconductor or insulator, the workpiece support further comprising means for intermittently feeding RF power to the at least one Langmuir probe, and means for measuring a discharge of a capacitor in series with the at least one Langmuir probe while the RF power is not supplied to the at least one Langmuir probe.
A workpiece comprising a semiconductor wafer including at least one Langmuir probe embedded therein such that the probe is covered by a layer of semiconductor or insulator, and further comprising means for intermittently feeding RF power to the at least one Langmuir probe, and means for measuring a discharge of a capacitor in series with the at least one Langmuir probe while the RF power is not supplied to the at least one Langmuir probe.
Dependencies are inferred from the claim text.