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US 6,602,119 B1Granted
Dressing apparatus
AssigneeEbara Corporation
InventorsTetsuji Togawa, Kuniaki Yamaguchi, Nobuyuki Takada, Satoshi Wakabayashi
Life of this patent
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Abstract
Disclosed is a dressing apparatus wherein a polishing surface can be regenerated stably over a long period without any danger of an object to be polished being scratched. A dressing surface 50a of a dresser 48 is caused to slide on a polishing surface 30a of a polishing table 22 while the dressing surface is urged against the polishing surface. The dressing surface is formed from a grindstone 50.
Claims24
A dressing apparatus comprising:
- a dressing surface of a dresser which is slidable on a polishing surface of a polishing table while said dressing surface is urged against said polishing surface, said dressing surface being formed from a grindstone, said grindstone comprising abrasive particles and resin for binding said abrasive particles;
- and
- a grindstone configuration normalizing mechanism for flattening said dressing surface, said grindstone configuration normalizing mechanism including a configuration correcting table which is to contact said dressing surface.
A polishing apparatus comprising:
- a polishing table having a polishing surface;
- a substrate holding member for holding a substrate and for urging said substrate against said polishing surface;
- a dressing apparatus including a dressing surface of a dresser which is slidable on said polishing surface of said polishing table while said dressing surface is urged against said polishing surface, said dressing surface being formed from a grindstone, said grindstone comprising abrasive particles and resin for binding said abrasive particles;
- and
- a configuration normalizing mechanism for flattening said dressing surface, said grindstone configuration normalizing mechanism including a configuration correcting table which is to contact said dressing surface.
2 more elements
Dependencies are inferred from the claim text.