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US 6,602,114 B1Granted
Multilayer retaining ring for chemical mechanical polishing
AssigneeApplied Materials, Inc.
InventorsJunshi Wang, Steven M. Zuniga
Life of this patent
Estimating the term…
Abstract
A carrier head for a chemical mechanical polishing apparatus includes a retaining ring having a flexible lower portion and a rigid upper portion. A shim can be inserted between the retaining ring and a base of the carrier head to improve the retaining ring lifetime. A seal may be inserted between the retaining ring and a flexible membrane to seal the chamber between the flexible membrane and the base.
Claims21
A carrier head, comprising:
- a carrier base;
- a retaining ring including a lower portion having a bottom surface for contacting a polishing pad during polishing and made of a first material, and an upper portion made of a second material which is more rigid than the first material;
- a flexible membrane coupled to the base and having a portion that provides a substrate mounting surface;
- a shim located between the carrier base and the upper portion of the retaining ring;
- and
- a seal coupled to the flexible membrane to seal a chamber between the carrier base and the flexible membrane.
3 more elements
A method of using a retaining ring, comprising:
- securing the retaining ring to a base in a carrier head without a shim between the base and the retaining ring, an outer edge of a flexible membrane being clamped between the retaining ring and the base;
- polishing a first plurality of substrates with the carrier head, a lower surface of the retaining ring contacting a polishing surface;
- removing the retaining ring from the carrier head after the lower surface of the ring has been worn by a first amount;
- resecuring the retaining ring to the carrier head with a first shim between the base and the retaining ring to compensate for the wear of the lower surface of the retaining ring;
- and
- polishing a second plurality of substrates with the carrier head.
3 more elements
A kit, comprising:
- a retaining ring including a lower portion having a bottom surface for contacting a polishing pad during polishing and made of a first material, and an upper portion made of a second material which is more rigid than the first material, a plurality of channels formed in the bottom surface of the retaining ring for carrying slurry inwardly;
- a shim to be inserted between a base of a carrier head and the upper portion of the retaining ring;
- and
- an annular seal to be inserted between a flexible membrane and the retaining ring.
1 more element
A method of using a retaining ring, comprising:
- securing the retaining ring to a base in a carrier head with a first shim between the base and the retaining ring, an outer edge of a flexible membrane being clamped between the retaining ring and the base;
- polishing a first plurality of substrates with the carrier head, a lower surface of the retaining ring contacting a polishing surface;
- removing the retaining ring and first shim from the carrier head after the lower surface of the ring has been worn by a first amount;
- resecuring the retaining ring to the carrier head with a second shim between the base and the retaining ring;
- and
- polishing a second plurality of substrates with the carrier head.
3 more elements
A method of using a retaining ring, comprising:
- securing the retaining ring to a base in a carrier head without a shim between the base and the retaining ring, an outer edge of a flexible membrane being clamped between the retaining ring and the base;
- selecting a predetermined amount of wear for a lower surface of the retaining ring;
- polishing a first plurality of substrates with the carrier head, the lower surface of the retaining ring contacting a polishing surface;
- removing the retaining ring from the carrier head after the lower surface of the ring has been worn by the predetermined amount;
- resecuring the retaining ring to the carrier head with a first shim between the base and the retaining ring;
- and
- polishing a second plurality of substrates with the carrier head.
4 more elements
Dependencies are inferred from the claim text.