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US 6,602,111 B1Granted
Abrasive
AssigneeSeimi Chemical Co., Ltd.
InventorsYoshinori Fujie, Sumihisa Yamaguchi
Life of this patent
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Abstract
An abrasive for planarization of glass substrates for hard discs comprising abrasive grains mainly composed of rare earth oxides containing cerium oxide, wherein the abrasive grains has a cerium oxide/total rare earth oxide ratio of 95 wt %.
Claims18
A polishing method for planarizing glass substrates for hard discs, which comprises polishing a glass substrate for a hard disc with a polishing cloth while supplying an abrasive comprising abrasive grains comprising rare earth oxides and cerium oxide to the polishing cloth, wherein the abrasive grains comprise at least 95 wt % cerium oxide.
Dependencies are inferred from the claim text.