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US 6,599,616 B1Granted
Parallel contact patterning using nanochannel glass (NCG)
AssigneeThe United States of America as represented by the Secretary of the Navy
InventorsRonald J. Tonucci, Douglas H. Pearson
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Abstract
The present invention is a method for modifying a substrate in a predetermined pattern, comprising the steps of: (a) applying a material to the face of an etched nanochannel glass (NCG), where this face has a pattern of channels corresponding to the predetermined pattern, and (b) contacting the substrate with the etched NCG face having applied material, under conditions for transferring the material to the substrate.
Claims7
A modified substrate, comprising:
- a substrate, wherein said substrate substantially comprises a polymer;
- and
- disposed on and in contact with said substrate, a plurality of at least 106 features comprising material deposited on said substrate wherein said features have a packing density of at least 104 features/cm2, wherein said features cover a patterned area on said substrate that is at least 1″ across, and wherein said features have a minimum feature size of less than 200 nm.
Dependencies are inferred from the claim text.