Electro-chemical deposition cell for face-up processing of single semiconductor substrates

An apparatus for electroplating a metal onto a substrate plating surface, comprising:

• a) an enclosure having an anode disposed at an upper portion thereof and a substrate support member disposed at a bottom portion thereof, the support member capable of holding a substrate with the substrate plating surface face-up and rotating the substrate during an electroplating process;
• b) a cathode clamp ring having an annular contact portion to electrically contact a peripheral portion of the substrate plating surface;
• c) a catch cup extending from an interior surface of the enclosure to a bottom surface of the cathode clamp ring;
• d) one or more rinse spray spouts disposed below the catch cup;
• and
• e) a rinse agent reservoir;
• and
• f) a rinse catch cup disposed below the rinse spray spouts, the rinse catch cup extending from the inner surface of the enclosure and forming an inner terminus that allows movement of the substrate support member therethrough.