Multilevel copper interconnects for ultra large scale integration
AssigneeMicron Technology, Inc.
InventorsKie Y. Ahn, Joseph E. Geusic
Life of this patent
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Abstract
A method of manufacturing integrated circuits using a thin metal oxide film as a seed layer for building multilevel interconnects structures in integrated circuits. Thin layer metal oxide films are deposited on a wafer, and standard optical lithography is used to expose the metal oxide film in a pattern corresponding to a metal line pattern. The metal oxide film is converted to a layer of metal, and a metal film may then be deposited on the converted oxide film by either selective CVD or electroless plating. Via holes are then fabricated in a similar process using via hole lithography. The process is continued until the desired multilevel structure is fabricated.
Claims12
A multi-layered integrated circuit, which comprises:
- at least one or more integrated devices;
- a first insulating layer of a metal oxide contacting the respective one or more integrated devices, and formed by depositing a metal oxide layer on the device;
- and
- a metal layer formed by converting one or more portions of the metal oxide layer to one or more converted portions of metal while at least other portions of the metal oxide remain, and depositing a layer of metal thereon.
A multi-layered integrated circuit which comprises:
- at least one or more integrated devices;
- a first insulating layer of a metal oxide contacting the respective one or more integrated devices formed by depositing a metal oxide layer on the device;
- a first metal layer formed by converting one or more portions of the metal oxide layer to one or more converted portions of metal while at least other portions of the metal oxide remain, and depositing a layer of metal thereon;
- a second insulating layer of metal oxide contacting the respective first metal layer, and formed by depositing a second metal oxide layer on the first metal layer;
- and
- a second metal layer formed by converting one or more portions of the second metal oxide layer to one or more converted portions of metal while at least other portions of the metal oxide remain, and by depositing a layer of metal thereon.
A multi-layered integrated circuit, which comprises:
- at least one or more integrated devices;
- a first insulating layer of a metal oxide contacting the respective one or more integrated devices and formed by depositing a metal oxide layer on the device;
- a first metal layer formed by converting one or more portions of the metal oxide layer to one or more converted portions of metal while at least other portions of the metal oxide remain, and depositing a layer of metal thereon;
- a second insulating layer of metal oxide contacting the respective first metal layer, and formed by depositing a second metal oxide layer on the first metal layer;
- a second metal layer formed by converting one or more portions of the second metal oxide layer to one or more converted portions of metal while at least other portions of the metal oxide remain, and by depositing a layer of metal thereon;
- a third insulating layer of metal oxide contacting the respective second metal layer, and formed by depositing a third metal oxide layer on the second metal layer;
- and
- a third metal layer formed by converting one or more portions of the third metal oxide layer to one or more converted portions of metal while at least other portions of the metal oxide remain, and by depositing a layer of metal thereon.
Dependencies are inferred from the claim text.