Cleaning method and cleaning apparatus of shadow mask
AssigneeKabushiki Kaisha Toshiba
InventorsYoshiaki Sawada, Kazumasa Hirayama
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Abstract
An ultrasonic wave is oscillated from an ultrasonic generator toward a shadow mask to permit the ultrasonic wave to remove the foreign matter attached to the shadow mask, thereby cleaning the shadow mask. A part of the ultrasonic wave oscillated from the ultrasonic generator toward the shadow mask is reflected by a reflector toward the shadow mask so as to irradiate the shadow mask.
Claims12
A method of cleaning a shadow mask including a mask body having electron beam passage apertures formed therein and a frame mask fixed to the peripheral portion of the mask body, the method comprising:
- arranging the shadow mask within an ultrasonic wave transmitting medium;
- oscillating an ultrasonic wave from an ultrasonic generator toward the shadow mask;
- and
- allowing an ultrasonic wave reflector to reflect at least partially the ultrasonic wave oscillated from the ultrasonic generator toward the shadow mask.
An apparatus of cleaning a shadow mask including a mask body having electron beam passage apertures formed therein and a mask frame fixed to the peripheral portion of the mask body, the apparatus comprising:
- a holding section for holding the shadow mask within an ultrasonic wave transmitting medium;
- an ultrasonic generator for oscillating an ultrasonic wave toward the shadow mask;
- and
- a reflector for reflecting at least partially the ultrasonic wave oscillated from the ultrasonic generator toward the shadow mask.
Dependencies are inferred from the claim text.