Method for controlling heat treatment in process of fabricating high purity silica glass
AssigneeSamsung Electronics Co., Ltd.
InventorsWon-Il Jeong, Young-Min Baik
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AssigneeSamsung Electronics Co., Ltd.
InventorsWon-Il Jeong, Young-Min Baik
Estimating the term…
Disclosed is a method for controlling a heat treatment in the process of fabricating a high purity silica glass via a sol-gel process using a low temperature heater having an inhalation line and an exhaust line. Accordingly, the method includes the steps of (a) identifying whether or not the diameter of the exhaust line is varied; (b) controlling the mass flow of the process gas according to the changed diameter of the exhaust line in step (a); (c) measuring an exhaust gas velocity discharged through the exhaust line; (d) comparing the exhaust gas velocity measured in the step (c) with the exhaust gas velocity after the scale of the exhaust line is varied; and, (e) repeating steps (b)-(d) if the comparison result in step (d) is different.
A method for maintaining a constant gas pressure within a low-temperature heater having an inhalation line and an exhaust line during one of the sol-gel process used to fabricate a high-purity silica glass, the method comprising the steps of:
A method for maintaining a constant gas pressure within a low-temperature heater having an inhalation line, an exhaust line during one of the sol-gel process used to fabricate a high-purity silica glass, wherein one end of said exhaust line is submerged in a perpendicular direction to a reservoir by a prescribed distance, the method comprising the steps of:
Dependencies are inferred from the claim text.