Run-to-run controller for use in microelectronic fabrication

A method for controlling a manufacturing process, comprising the steps of:

• (a) downloading variables form a plurality of variable parameter tables to a plurality of processing tools prior to operation of each tool;
• (b) operating said processing tools according to said downloaded variables;
• (c) receiving, at a supervisory station, metrology data from a plurality of metrology tools monitoring operation of said processing tools;
• (d) applying said metrology data to at least one model structure relating said metrology data to said variables including a target set-point for a next processing tool, and generating an output thereby;
• and
• (e) updating one or more of said variable parameter tables in response to said output and controlling operation of the next processing tool using another model structure associated with the next processing tool in a feed-back control loop.

A run-to-run controller for controlling a manufacturing process, comprising:

• a first processing tool;
• a first metrology tool for obtaining metrology data from said first processing tool;
• a second processing tool;
• a second metrology tool for obtaining metrology data from said second processing tool;
• and
• a supervisory station, said supervisory station comprising
• an interface for receiving said metrology data from said first metrology tool;
• and
• a first model structure relating said metrology data from said first metrology tool to a target set-point for said second processing tool;
• a second model structure used in controlling operation of said second processing tool in a feed-back control loop;
• and
• a first variable parameter table for said first processing tool and a second variable parameter table for said second processing tool;
• wherein all or part of said first variable parameter table is downloaded to said first processing tool prior to operation of said first processing tool, wherein all or part of said second variable parameter table is downloaded to said second processing tool prior to operation of said second processing tool, and wherein one or more variables in said second variable parameter table are modified in response to application of said first model structure to said received metrology data.

A method of controlling a manufacturing process, comprising the steps of:

• (a) obtaining metrology data from a first metrology tool with respect to a first processing tool;
• (b) applying said metrology data to a first model structure relating said metrology data to a target set-point for a second processing tool and using a second model structure to control operation of the second processing tool in a feed-back control loop;
• (c) modifying one or more variables in a variable parameter table for said second processing tool in response to application of the first model structure to the received metrology data;
• (d) downloading said one or more modified variables to said second processing tool;
• (e) operating said second processing tool in accordance with said downloaded variables.

A supervisory station for managing run-to-run control of a manufacturing process, comprising:

• an interface for receiving metrology data from a plurality of said metrology tools;
• a control model relating said metrology data from one metrology tool to a target set-point for a next processing tool;
• another control model used in controlling operation of said next processing tool in a feed-back control loop;
• and
• a memory, said memory storing a plurality of output control variables for controlling the operation of a plurality of processing tools;
• and
• at least one processor for executing one or more processes for controlling said metrology tools by adjusting said output control variables based upon the received metrology data and one or more control models, said control models selectable from a plurality of control model formats stored in said memory wherein one or more control variables for controlling the operation of the next processing tool are modified in response to application of the control model to the received metrology data.