High-frequency power supply apparatus for plasma generation apparatus

A high-frequency power supply apparatus for a plasma generation apparatus having a modulator for generating an intermittent high-frequency output on the basis of a modulation reference signal and a peak value setting signal, said high-frequency power supply apparatus comprising:

• a first control loop including a peak value detector for detecting a peak value of said intermittent high-frequency output, and an output controller for comparing the peak value of said intermittent high-frequency output detected by said peak value detector with a preset peak value of said high-frequency output so that said output controller controls the peak value of said high-frequency output to be said preset peak value;
• and
• a second control loop including a monitor for detecting an average value of said intermittent high-frequency output, an arithmetic operation means for calculating an average value of said intermittent high-frequency output on the basis of the preset peak setting value and a preset duty ratio setting value, and a pulse generator for generating a modulation reference signal for controlling said modulator on the basis of the average value of said high-frequency output detected by said monitor and the average value of said high-frequency output calculated by said arithmetic operation means.