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US 6,586,753 B2Granted
Electron beam apparatus and electron beam adjusting method
AssigneePioneer Corporation
InventorYasumitsu Wada
Life of this patent
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Abstract
An electron beam apparatus for irradiating a target with an electron beam includes a reference sample including at least one reference pattern which has a plurality of lattice structures arranged along the circumference of a circle in a evaluation surface of the reference sample; and an adjustment section for adjusting the electron beam by irradiating the evaluation surface with the electron beam on the basis of electrons generated from the reference sample.
Claims10
An electron beam apparatus for irradiating a target with an electron beam, comprising:
- a reference sample including at least one reference pattern which has a plurality of lattice structures arranged along the circumference of a circle in a evaluation surface of said reference sample;
- and
- an adjustment section for adjusting said electron beam by irradiating said evaluation surface with said electron beam on the basis of electrons generated from said reference sample.
A method of adjusting an electron beam for irradiation of a target, comprising:
- providing a reference sample including at least one reference pattern which has a plurality of lattice structures arranged along the circumference of a circle in a evaluation surface of said reference sample;
- scanning said electron beam on the plurality of lattice structures within the same reference pattern;
- converting a change in electrons caused by the scanning operation into an electric signal;
- and
- comparing a plurality of waveform blocks corresponding to said respective lattice structures within said electric signal to adjust said electron beam such that said waveform blocks become uniform.
2 more elements
Dependencies are inferred from the claim text.