Apparatus and methods for secondary electron emission microscope with dual beam
AssigneeKLA-Tencor Corporation
InventorsLee Veneklasen, David L. Adler
Life of this patent
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AssigneeKLA-Tencor Corporation
InventorsLee Veneklasen, David L. Adler
Estimating the term…
Disclosed is an apparatus for inspecting a sample. The apparatus includes a first electron beam generator arranged to direct a first electron beam having a first range of energy levels toward a first area of the sample and a second electron beam generator arranged to direct a second electron beam having a second range of energy levels toward a second area of the sample. The second area of the sample at least partly overlaps with the first area, and the second range of energy levels are different from the first range such that charge build up caused by the first electron beam is controlled. The apparatus further includes a detector arranged to detect secondary electrons originating from the sample as a result of the first and second electron beam interacting with the sample
An apparatus for inspecting a sample comprising:
A method for controlling charging of a surface while exposing the surface to a beam of charged particles, comprising:
Dependencies are inferred from the claim text.