Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same

A method for synthesizing a photoresist monomer represented by the following Chemical Formula 1 comprising;

• (a) dissolving a di-alcohol compound in an organic solvent;
• (a) adding an acid catalyst or a base to the resultant solution with stirring;
• and
• (a) adding an anhydride compound to the resultant solution to obtain a compound of Formula 1:
• wherein,
• R is substituted or non-substituted linear or branched (C1-C10) alkyl, substituted or non-substituted (C1-C10) ether, substituted or non-substituted (C1-C10) ester, or substituted or non-substituted (C1-C10) ketone;
• X and Y are independently CH2, CH2CH2, oxygen or sulfur;
• and
• i is 0 or an integer of 1 to 2.

A method for synthesizing the photoresist monomer represented by Chemical Formula 2 below, comprising;

• (a) reacting a maleic anhydride and a di-alcohol compound in the presence of an acid catalyst, as shown in Reaction Scheme 1 below;
• and
• (a) performing a Diels-Alder reaction with the resultant product, as shown in Reaction Scheme 2 below:
• wherein,
• Y is CH2, CH2CH2, oxygen or sulfur;
• Z is carbon or oxygen;
• R1 and R2 are independently H or an (C1-C5) alkyl;
• and
• m and n are independently 0 or an integer of 1 to 5.