Method for producing circuit structures on a semiconductor substrate and semiconductor configuration with functional circuit structures and dummy circuit structures

A semiconductor configuration, comprising

• a semiconductor substrate;
• functional circuit structures disposed on said semiconductor substrate, said functional circuit structures having field configurations with a marginal region;
• dummy circuit structures formed by photoresist structures on said semiconductor substrate in said marginal region of said field configurations of said functional circuit structures, said dummy circuit structures including partial structures of said functional circuit structures, when a surface of said dummy circuit structures is smaller than a prescribed minimum size, which is determined by a smallest required surface of a photoresist structure to adhere on the semiconductor substrate;
• and
• said dummy circuit structures including first dummy circuit structures and second dummy circuit structures produced with an aid of a lithography process and disposed on said semiconductor substrate, each of said first dummy circuit structures joined to one of said second dummy circuit structures so that a minimum structural size is exceeded, said first dummy circuit structures being smaller than the minimum structural size.