Anti-reflection coating with transparent surface conductive layer
AssigneeApplied Vacuum Coating Technologies Co., Ltd.
InventorJau-Jier Chu
Life of this patent
Estimating the term…
Abstract
An anti-reflection coating layer system is composed of 4 oxide layers. The material of surface layer is a transparent conductive coating and has a high refractive index between 1.9 to 2.1. The materials used for the surface layer are a transparent conductive coating such as SnO2, ZnO2, In2O3, and ITO.
Claims11
An anti-reflection conductive coating applied to a substrate comprising four layers designated as first, second, third, and fourth layers in consecutive numerical order beginning with the layer farthest from the substrate;
- said first layer overlaying the second layer to form a surface layer and comprising a transparent conductive oxide material having a high refraction index substantially greater than 1.50, the first layer having a physical thickness of 10-40 nm;
- said second layer overlaying the third layer and comprising an oxide material having a low refraction index substantially less than said high refraction index of said first layer, the second layer having a physical thickness of 30-60 nm;
- said third layer overlaying the fourth layer and comprising an oxide material having a high refraction index substantially greater than 1.50, the third layer having a physical thickness of 30-80 nm;
- said fourth layer overlaying a front surface of the substrate and comprising oxide material having high refraction index substantially greater than 1.50, the fourth layer having a physical thickness of 40-80 nm.
An anti-reflection conductive coating applied to a substrate comprising four layers designated as first, second, third, and fourth layers in consecutive numerical order beginning with the layer farthest from the substrate;
- said first layer overlaying the second layer to form a surface layer and comprising a transparent conductive oxide material having a high refraction index substantially greater than 1.50, the first layer having a physical thickness of 10-40 nm;
- said second layer overlaying the third layer and comprising an oxide material having a low refraction index substantially less than said high refraction index of said first layer, the second layer having a physical thickness of 30-60 nm;
- said third layer overlaying the fourth layer and comprising an oxide material having a high refraction index substantially greater than 1.50, the third layer having a physical thickness of 30-80 nm;
- said fourth layer overlaying a front surface of the substrate and comprising oxide material having high refraction index substantially greater than 1.50, the fourth layer having a physical thickness of 40-80 nm.
- wherein said first layer is ITO, said second layer is SiO2, said third layer is a Niobium oxide and said fourth layer is a Silicon-Oxygen compound of Niobium.
An anti-reflection conductive coating applied to a substrate comprising four layers designated as first, second, third, and fourth layers in consecutive numerical order beginning with the layer farthest from the substrate;
- said first layer overlaying the second layer to form a surface layer and comprising a transparent conductive oxide material having a high refraction index substantially greater than 1.50, the first layer having a physical thickness of 10-40 nm;
- said second layer overlaying the third layer and comprising an oxide material having a low refraction index substantially less than said high refraction index of said first layer, the second layer having a physical thickness of 30-60 nm;
- said third layer overlaying the fourth layer and comprising an oxide material having a high refraction index substantially greater than 1.50, the third layer having a physical thickness of 30-80 nm;
- said fourth layer overlaying a front surface of the substrate and comprising oxide material having high refraction index substantially greater than 1.50, the fourth layer having a physical thickness of 40-80 nm.
- wherein said second layer comprises a material selected from the group consisting of:
- SiO2 and SiAlO2.
An anti-reflection conductive coating applied to a substrate comprising four layers designated as first, second, third, and fourth layers in consecutive numerical order beginning with the layer farthest from the substrate;
- said first layer overlaying the second layer to form a surface layer and comprising a transparent conductive oxide material having a high refraction index substantially greater than 1.50, the first layer having a physical thickness of 10-40 nm;
- said second layer overlaying the third layer and comprising an oxide material having a low refraction index substantially less than said high refraction index of said first layer, the second layer having a physical thickness of 30-60 nm;
- said third layer overlaying the fourth layer and comprising an oxide material having a high refraction index substantially greater than 1.50, the third layer having a physical thickness of 30-80 nm;
- said fourth layer overlaying a front surface of the substrate and comprising oxide material having high refraction index substantially greater than 1.50, the fourth layer having a physical thickness of 40-80 nm.
- wherein said fourth layer comprises a material selected from the group consisting of:
- a Tantalum-Silicon oxide, a Niobium oxide, a Titanium-Silicon oxide, and Indium-Silicon oxide, a Tin-Silicon oxide, and mixtures of these oxides.
Dependencies are inferred from the claim text.