Semiconducting oxide nanostructures
AssigneeGeorgia Tech Research Corporation
InventorsZhong L. Wang, Zhengwei Pan, Zurong Dai
Life of this patent
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Abstract
Nanostructures and methods of fabricating nanostructures are disclosed. A representative nanostructure includes a substrate having at least one semiconductor oxide. In addition, the nanostructure has a substantially rectangular cross-section. A method of preparing a plurality of semiconductor oxide nanostructures that have a substantially rectangular cross-section from an oxide powder is disclosed. A representative method includes: heating the oxide powder to an evaporation temperature of the oxide powder for about 1 hour to about 3 hours at about 200 torr to about 400 torr in an atmosphere comprising argon; evaporating the oxide powder; and forming the plurality of semiconductor oxide nanostructures.
Claims20
A nanostructure, comprising:
- a free standing semiconductor oxide nanostructure having a substantially rectangular cross-section, wherein the nanostructure is within the range of:
- about 20 nanometers to about 6000 nanometers in width, about 5 nanometers to about 100 nanometers in height, and about 100 nanometers to about 3 millimeters in length.
A nanostructure comprising:
- a free standing semiconductor oxide nanostructure having a top, a bottom, a right side, and a left side, wherein the top and the bottom have the same width and wherein the right side and the left side have the same height, and wherein the nanostructure is within the range of:
- about 20 nanometers to about 6000 nanometers in width, about 5 nanometers to about 100 nanometers in height, and about 100 nanometers to about 3 millimeters in length.
Dependencies are inferred from the claim text.