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US 6,586,049 B2Granted
Patterning method using mask and manufacturing method for composite type thin film magnetic head using the patterning method
AssigneeTDK Corporation
InventorsYasufumi Uno, Toru Inoue, Tetsuya Mino, Koji Matsukuma
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Abstract
A method of patterning at least one object layer, includes a step of forming a mask on the object layer, and a step of selectively etching the object layer using the mask. The mask is made of a magnetic metallic compound with a basic metal of nickel or cobalt containing at least group 3B element and/or group 5B element.
Claims17
A method of patterning at least one object layer, comprising the steps of:
- forming a mask on said object layer;
- and
- selectively etching said object layer using said mask, said mask being made of a magnetic metallic compound with a basic metal of nickel or cobalt and containing at least 0.2 to 4.0 wt. % of boron or 0.2 to 8 wt. % of phosphorous.
A method of manufacturing a composite thin film magnetic head with an inductive recording head part and a magnetoresistive reproducing head part, said method comprising the steps of:
- forming recording magnetic pole layers of said thin film magnetic head;
- forming a mask on said recording magnetic pole layers;
- and
- selectively etching said recording magnetic pole layers using said mask,
- said mask being made of a magnetic metallic compound with a basic metal of nickel or cobalt and containing at least 0.2 to 4.0 wt. % of boron or 0.2 to 8 wt. % of phosphorous.
2 more elements
Dependencies are inferred from the claim text.