Illuminating system of a microlithographic projection exposure arrangement

An illuminating system of a microlithographic projection exposure arrangement comprising:

• a light source;
• a first objective defining an optical axis;
• a fly-eye-integrator mounted on said axis and being illuminated by said first objective with light from said light source to form a plurality of beams;
• said fly-eye-integrator including a first one-dimensional array of first cylinder lenses having respective first cylinder axes;
• a second one-dimensional array of second cylinder lenses having respective second cylinder axes orientated perpendicularly to said first cylinder axes;
• and, a third one-dimensional array of third cylinder lenses having respective third cylinder axes orientated parallel to said second cylinder axes;
• a diaphragm plane on said optical axis directly downstream of said fly-eye-integrator;
• and,
• said third one-dimensional array being disposed in the vicinity of said diaphragm plane.

A microlithographic projection exposure arrangement comprising:

• an illuminating system including:
• a light source;
• a first objective defining an optical axis;
• a fly-eye-integrator mounted on said axis and being illuminated by said first objective with light from said light source to form a plurality of beams;
• said fly-eye-integrator including a first one-dimensional array of first cylinder lenses having respective first cylinder axes;
• a second one-dimensional array of second cylinder lenses having respective second cylinder axes orientated perpendicularly to said first cylinder axes;
• a third one-dimensional array of third cylinder lenses having respective third cylinder axes orientated parallel to said first cylinder axes;
• and, a fourth one-dimensional array of fourth cylinder lenses having respective fourth cylinder axes orientated parallel to said second cylinder axes;
• said third one-dimensional array being configured for increasing divergence and being disposed forward of said first one-dimensional array;
• and, said fourth one-dimensional array being configured for increasing divergence and being mounted on said optical axis forward of said second one-dimensional array;
• a diaphragm plane on said optical axis directly downstream of said fly-eye-integrator;
• a condenser optic for superposing said plurality of beams into an image plane to illuminate a field;
• a first carrier system for supporting a mask on said optical axis downstream of said condenser optic;
• a projection objective arranged on said optical axis downstream of said mask;
• and,
• a second carrier system for supporting a light sensitive substrate on said optical axis and downstream of said projection objective.

A method of making microstructured components comprising the steps of:

• providing a microlithographic projection exposure arrangement including:
• an illuminating system including:
• a light source;
• a first objective defining an optical axis;
• a fly-eye-integrator mounted on said axis and being illuminated by said first objective with light from said light source to form a plurality of beams;
• said fly-eye-integrator including a first one-dimensional array of first cylinder lenses having respective first cylinder axes;
• a second one-dimensional array of second cylinder lenses having respective second cylinder axes orientated perpendicularly to said first cylinder axes;
• a third one-dimensional array of third cylinder lenses having respective third cylinder axes orientated parallel to said first cylinder axes;
• and, a fourth one-dimensional array of fourth cylinder lenses having respective fourth cylinder axes orientated parallel to said second cylinder axes;
• said third one-dimensional array being configured for increasing divergence and being disposed forward of said first one-dimensional array;
• and, said fourth one-dimensional array being configured for increasing divergence and being mounted on said optical axis forward of said second one-dimensional array;
• a diaphragm plane on said optical axis directly downstream of said fly-eye-integrator;
• a condenser optic for superposing said plurality of beams into an image plane to illuminate a field;
• a first carrier system for supporting a mask on said optical axis downstream of said condenser optic;
• a projection objective arranged on said optical axis downstream of said mask;
• and, a second carrier system for supporting a light sensitive substrate on said optical axis and downstream of said projection objective;
• placing a light sensitive substrate on said second carrier system;
• selecting said mask to have a predetermined pattern;
• imaging said pattern onto said light sensitive substrate;
• and,
• exposing said light sensitive substrate utilizing said microlithographic projection exposure arrangement and said mask thereof to structure said substrate.