Back to results
US 6,583,068 B2Granted
Enhanced inspection of extreme ultraviolet mask
AssigneeIntel Corporation
InventorsPei-Yang Yan, Ted Liang, Guojing Zhang
Life of this patent
Estimating the term…
Abstract
The present invention discloses a method of increasing the contrast of an EUV mask at inspection by forming a multilayer mirror over a substrate; forming an absorber layer over the multilayer mirror; forming a top layer over the absorber layer; patterning the mask into a first region and a second region; and removing the top layer and the absorber layer in the first region.
Claims10
A method of fabricating a mask comprising:
- providing a substrate;
- forming a mirror over said substrate, said mirror being reflective at a first wavelength;
- forming an absorber layer over said mirror, said absorber layer being absorbent at said first wavelength;
- forming a top layer from an original surface of said absorber layer, said top layer being more absorbent than said absorber layer at a second wavelength;
- patterning said mask into a first region and a second region;
- and
- removing said top layer and said absorber layer in said first region.
4 more elements
A method of fabricating a mask comprising:
- providing a substrate;
- forming a multilayer mirror over said substrate, said multilayer mirror to reflect at an exposure wavelength;
- forming an absorber layer over said multilayer mirror, said absorber layer to absorb at said exposure wavelength;
- forming a top layer by incorporating Fluorine at an upper surface of said absorber layer, said top layer to increase contrast at an inspection wavelength;
- patterning said mask into a first region and a second region;
- and
- removing said top layer and said absorber layer in said first region.
4 more elements
Dependencies are inferred from the claim text.