Back to results
US 6,582,880 B2Granted
Polymers, resist compositions and patterning process
AssigneesShin-Etsu Chemical Co., Ltd., Matsushita Electric Industrial Co., Ltd., Central Glass Company, Limited
InventorsYuji Harada, Jun Watanabe, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo, Shinji Kishimura, Michitaka Ootani, Satoru Miyazawa, Kentaro Tsutsumi, Kazuhiko Maeda
Life of this patent
Estimating the term…
Abstract
An acrylate resin containing fluorinated alkyl groups in ester side chains has high transmittance to VUV radiation. A resist composition using the resin as a base polymer is sensitive to high-energy radiation, has excellent sensitivity and resolution, and is suited for lithographic microprocessing.
Claims20
A polymer comprising recurring units of formula (1):
- wherein, R1 to R3 are, each independently, hydrogen, fluorine, a straight, branched or cyclic alkyl or a fluorinated alkyl group of 1 to 20 carbon atoms, R4 is a monovalent fluorinated hydrocarbon group of 1 to 20 carbon atoms containing at least one fluorine atom, R5 is an acid labile group, R6 is an adhesive group, subscripts k, m and n are numbers satisfying 0<k+m+n≦1 and at least one of the units containing R4 to R6 has an alicyclic structure.
Dependencies are inferred from the claim text.