Target fabrication method for cylindrical cathodes
AssigneeSeagate Technology LLC
InventorPaul Stephen McLeod
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Abstract
A method for fabricating cylindrical sputter targets for rotary cylindrical cathodes used in depositing a dielectric layer of desired alloy on non-planar substrates during sputtering is disclosed. The method includes forming a cooling tube having a passage within to receive a cooling medium, then fabricating multiple annular rings including each of the basic metal constituents of the desired alloy and attaching the annular rings to the cooling tube such that the exposed outer portions of the annular rings provide a homogeneous layer of the desired alloy on the non-planar substrates during sputtering.
Claims19
A method of fabricating a cylindrical sputter target for a rotary cylindrical cathode, comprising:
- (a) forming a cooling tube having a passage within to receive a cooling medium;
- (b) fabricating multiple annular rings using each basic metal constituent of a layer of desired alloy to be sputtered onto a substrate;
- and
- (c) attaching the fabricated annular rings over the cooling tube such that an exposed portion of the annular rings provide a homogeneous layer of the desired alloy on the substrate when used as the rotary cylindrical cathode during sputtering.
A rotary cylindrical cathode for a sputter target, comprising:
- a cooling tube having a passage within to receive a cooling medium, wherein the cooling tube has an outer surface;
- and
- a plurality of annular rings having inner and outer ring surfaces, the annular rings made of basic metal constituents of a desired alloy, wherein the inner ring surface of the annular rings are arranged and disposed over the outer surface of the cooling tube such that the outer ring surfaces of the annular rings provide a substantially homogeneous layer of the desired alloy on a non-planar substrate during sputtering.
Dependencies are inferred from the claim text.