Electron-emitting device, electron source and manufacture method for image-forming apparatus

A method of manufacturing an electron source, comprising the steps of:

• forming plural pairs of conductors on a substrate, the conductors being spaced from each other;
• and
• an activation process of depositing carbon or carbon compound on at least one side of each of the plural pairs of conductors in an atmosphere of carbon compound gas,
• wherein said activation process includes a plurality of processes of two or more stages including a first process and a second process, and the first process is executed in an atmosphere of the carbon compound gas having a partial pressure higher than a partial pressure of the carbon compound gas in the second process, and wherein the second process is the last activation process, wherein
• the second process is terminated at a smaller value of device current flowing through the pair of conductors than a value of the device current at the termination of the first process.

A method of manufacturing an electron source, comprising the steps of:

• forming a plurality of electroconductive films each including an electron-emitting region and disposed between electrodes;
• and
• an activation process of depositing carbon or carbon compound on each of the plurality of electroconductive films in an atmosphere of carbon compound gas,
• wherein said activation process includes a plurality of processes of two or more stages including a first process and a second process, and the first process is executed in an atmosphere of the carbon compound gas having a partial pressure of the carbon compound gas in the second process, and wherein the second process is the last activation process, wherein
• the second process is terminated at a smaller value of device current than a value of the device current at the termination of the first process.

A method of manufacturing an electron-emitting device, comprising the steps of:

• forming an electroconductive film including an electron-emitting region and disposed between electrodes;
• and
• an activation process of depositing carbon or carbon compound on the electroconductive film in an atmosphere of carbon compound gas,
• wherein said activation process includes a plurality of processes of two or more stages including a first process and a second process, and the first process is executed in an atmosphere of the carbon compound gas having a partial pressure higher than a partial pressure of the carbon compound gas in the second process, and wherein the second process is the last activation process, wherein
• the second process is terminated at a smaller value of device current than a value of the device current at the termination of the first process.

A method of manufacturing an electron source comprising the steps of:

• forming plural pairs of conductors on a substrate, the conductors being spaced from each other;
• and
• an activation process of depositing carbon or carbon compound on at least one side of each of the plural pairs of conductors in an atmosphere of carbon compound gas, wherein
• said activation process includes a plurality of processes of two or more stages including a first process and a second process, and the first process is executed in an atmosphere of the carbon compound gas having a partial pressure higher than a partial pressure of the carbon compound gas in the second process, and wherein the second process is the last activation process,
• the first process is terminated in accordance with an evaluation result of electrical characteristics of each of the plural pairs of conductors,
• the electrical characteristics are a device current flowing through each of the plural pairs of conductors, and
• the first process is terminated after a predetermined time after the device current exceeds a reference value which is equal to or larger than a device current obtained when the second process is terminated.

A method of manufacturing an electron source comprising the steps of:

• forming a plurality of electroconductive films each including an electron-emitting region and disposed between electrodes;
• and
• an activation process of depositing carbon or carbon compound on each of the plurality of electroconductive films in an atmosphere of carbon compound gas, wherein
• said activation process includes a plurality of processes of two or more stages including a first process and a second process, and the first process is executed in an atmosphere of the carbon compound gas having a partial pressure higher than a partial pressure of the carbon compound gas in the second process, and wherein the second process is the last activation process,
• the first process is terminated in accordance with an evaluation result of electrical characteristics of each of the plural pairs of conductors,
• the electrical characteristics are a device current flowing through the electrodes, and
• the first process is terminated after a predetermined time after the device current exceeds a reference value which is equal to or larger than a device current obtained when the second process is terminated.