Gas delivery at high flow rates

A method for maintaining the evaporation of a liquefied compressed gas in a storage vessel during vapor delivery comprising

• a. passing a liquefied compressed high-purity semiconductor gas into a storage vessel;
• b. positioning a temperature measuring means onto the wall of the storage vessel;
• c. positioning at least one heating means proximate to the storage vessel;
• d. monitoring the temperature of the compressed gas within the storage vessel with the temperature measuring means;
• e. positioning a pressure measuring means at an outlet of the storage vessel;
• f. monitoring the pressure of the compressed gas within the storage vessel with the pressure measuring means;
• g. passing a portion of a gas out of the storage vessel;
• and
• h. adjusting the heat output of the heating means to maintain a desired pressure.

A method for delivering a liquefied compressed gas with a high rate of flow comprising

• a. passing a liquefied compressed high-purity semiconductor gas into a storage vessel;
• b. positioning a temperature measuring means onto the wall of the compressed gas storage vessel;
• c. positioning at least one heating means proximate to the storage vessel;
• d. monitoring the resulting temperature with the temperature measuring means;
• e. positioning a pressure measuring means at the outlet of the storage vessel and monitoring the vessel pressure;
• f. adjusting the heat output of the heating means to heat the liquefied compressed gas in the storage vessel to control the evaporation of the liquefied compressed gas in the storage vessel;
• and
• g. controlling the flow of the gas from the storage vessel.

A method for delivering ammonia with a high rate of flow comprising

• a. passing a high-purity liquefied compressed ammonia gas into a ton container;
• b. positioning a thermocouple onto the wall of the ton container;
• c. positioning at least one heating means proximate to the ton container;
• d. monitoring the thermocouple;
• e. positioning a pressure transducer at the outlet of the ton container and monitoring the vessel pressure;
• f. monitoring the average weight loss of the liquefied compressed ammonia in the ton container;
• g. adjusting the temperature from the output of the heating means to heat the liquefied ammonia in the ton container;
• h. boiling the liquefied compressed ammonia under convective and nucleate boiling regimes;
• i. controlling the evaporation of the liquefied compressed ammonia in the ton container under the convective and nucleate boiling regimes;
• and
• j. controlling the flow of ammonia from the ton container.

A system for delivering a semiconductor process gas with a high rate of flow comprising

• a. a storage vessel containing a liquefied compressed semiconductor process gas;
• b. a temperature measuring means positioned onto the wall of the storage vessel;
• c. a pressure probe positioned at the outlet of the storage vessel;
• d. a heating means positioned proximate to the storage vessel, wherein the temperature probe and pressure probe is used to adjust the output of the heater to heat the liquefied compressed semiconductor gas in the compressed gas storage vessel and enabling the high flow of semiconductor gas from the compressed gas storage vessel;
• and
• e. a valve means to control the flow of the semiconductor gas flowing from the storage vessel.