Fabricating an electrostatic chuck having plasma resistant gas conduits
AssigneeApplied Materials, Inc.
InventorsKadthala R. Narendrnath, Shamouil Shamouilian, Dennis S. Grimard
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Abstract
A method of fabricating an electrostatic chuck capable of holding a substrate in a chamber comprises forming an at least partially sintered dielectric insert, forming a dielectric preform comprising an electrode and a gas conduit, and placing the dielectric insert in the gas conduit of the dielectric preform, and sintering the dielectric preform and the dielectric insert.
Claims20
A method of fabricating an electrostatic chuck capable of holding a substrate in a chamber, the method comprising:
- (a) forming an at least partially sintered dielectric insert;
- (b) forming a dielectric preform comprising an electrode and a gas conduit, and placing the dielectric insert in the gas conduit of the dielectric preform;
- and
- (c) after (b) sintering the dielectric preform and the dielectric insert.
A method of fabricating an electrostatic chuck capable of holding a substrate in a chamber, the method comprising:
- (a) forming an at least partially sintered dielectric insert;
- (b) forming an unsintered dielectric preform comprising an electrode and a gas coiiduit and placing the dielectric insert in the gas conduit of the unsintered dielectric preform;
- and
- (c) simultaneously sintering the dielectric preform and the dielectric insert.
A method of fabricating an electrostatic chuck capable of holding a substrate in a chamber, the method comprising:
- (a) at least partially sintering a dielectric insert at a temperature of at least about 500°C;
- (b) forming an unsintered dielectric preform comprising an electrode and a gas conduit, and placing the dielectric insert in the gas conduit of the unsintered dielectric preform;
- and
- (c) simultaneously sintering the dielectric preform and the dielectric insert at a temperature of at least about 1000° C. while applying a pressure to the dielectric preform.
Dependencies are inferred from the claim text.