Tunable nanomasks for pattern transfer and nanocluster array formation
AssigneeThe Regents of the University of Colorado
InventorsThomas Andrew Winningham, Kenneth Douglas
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Abstract
A method of manufacturing an array of nanostuctures, such as quantum dots, having a controlled diameter and a substrate with an ordered array of nanostructures having a controlled diameter. In a preferred embodiment of the invention, nanoscale features are produced on a substrate by using a porous crystalline protein as a template for preparing an etch/deposition mask having a regular array of nanoscale pores of a diameter different from the protein template. The mask may be used to etch a regular array of nanoscale wells and/or deposit nanoclusters of adatoms on the surface of an underlying substrate. A further embodiment of the invention is a substrate including an ordered array of nanoscale features having a controlled size.
Claims19
A method for preparing masks having ordered arrays of nanoscale pores, the method comprising the steps of:
- providing a patterning mask having a structure including an ordered array of nanoscale pores;
- mounting said patterning mask on a substrate;
- and
- applying a coating to at least part of said patterning mask by rotary shadowing at a preselected angle to form an etch/deposition mask having a preselected effective pore diameter different from the pore diameter of said patterning mask.
A method for fabricating ordered arrays of nanoscale features, the method comprising the steps of:
- providing a patterning mask having a structure including an ordered array of nanoscale pores;
- applying a coating to at least part of said patterning mask by rotary shadowing at a preselected angle to form an etch/deposition mask having a preselected effective pore diameter different from the pore diameter of said patterning mask;
- and
- using said etch/deposition mask for performing at least one operation on a substrate, wherein said operation is selected from depositing material on said substrate and removing material from said substrate based on the locations of the pores.
Dependencies are inferred from the claim text.