Single electron tunneling transistor having multilayer structure
AssigneeJapan Science and Technology Corporation
InventorsTsutomu Yamashita, Sang-Jae Kim
Life of this patent
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Abstract
A single electron tunneling transistor which has a multi-layer structure exhibiting a single electron tunneling effect even with processing accuracy of not greater than 0.1 μm. The multi-layer structure of the single electron tunneling transistor is characterized by alternately growing an electrically conductive layer and a tunneling barrier layer. The number of layers is 50 or more. The structure has a minute tunneling junction having an area on the order of 1 μm square.
Claims1
A single electron tunneling transistor having a multilayer structure, comprising a plurality of electrically conductive layers and a plurality of tunneling barrier layers, the conductive layers and the tunneling barrier layers being alternately stacked one on another, and a control gate, the total number of the conductive layers and the tunneling barrier layers being at least 50, and a minute tunneling junction in the structure having an area on the order of 1 μm square, wherein the control gate is formed at a central portion of the single electron tunneling transistor, a first and a second pair of grooves provided for centering the control gate, the grooves of each pair opening in opposite directions so as to permit an electric field to be applied to the bottom portion of the grooves.
Dependencies are inferred from the claim text.